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Photonic Damascene Process for Integrated High-Q Microresonator Based Nonlinear Photonics

机译:基于集成高Q微谐振器的光子大马士革工艺   非线性光子学

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摘要

High confinement, integrated silicon nitride (SiN) waveguides have recentlyemerged as attractive platform for on-chip nonlinear optical devices. Thefabrication of high-Q SiN microresonators with anomalous group velocitydispersion (GVD) has enabled broadband nonlinear optical frequency combgeneration. Such frequency combs have been successfully applied in coherentcommunication and ultrashort pulse generation. However, the reliablefabrication of high confinement waveguides from stoichiometric, high stress SiNremains challenging. Here we present a novel photonic Damascene fabricationprocess enabling the use of substrate topography for stress control and thinfilm crack prevention. With close to unity sample yield we fabricatemicroresonators with $1.35\,\mu\mathrm{m}$ thick waveguides and optical Qfactors of $3.7\times10^{6}$ and demonstrate single temporal dissipative Kerrsoliton (DKS) based coherent optical frequency comb generation. Our newlydeveloped process is interesting also for other material platforms, photonicintegration and mid infrared Kerr comb generation.
机译:高限制,集成氮化硅(SiN)波导最近已成为片上非线性光学器件的有吸引力的平台。具有异常群速度色散(GVD)的高Q SiN微谐振器的制造已实现了宽带非线性光频率梳的产生。这样的频率梳已经成功地应用于相干通信和超短脉冲的产生。然而,由化学计量的高应力SiN可靠地制造高限制波导仍然具有挑战性。在这里,我们提出了一种新颖的光子金属镶嵌制造工艺,该工艺能够利用衬底形貌来控制应力和防止薄膜裂纹。以接近统一的样品产量,我们制造了具有$ 1.35 \,\ mu \ mathrm {m} $厚的波导和$ 3.7 \ times10 ^ {6} $的光学Q因子的微谐振器,并演示了基于单个时间耗散Kerrsoliton(DKS)的相干光频率梳的产生。我们新开发的工艺对于其他材料平台,光子集成和中红外Kerr梳子的产生也很有趣。

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